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Ozone Generators
 
 
          Opti Sense 5000 Opti Sense 5000                   
(rear view)                   
 
IN USA's OPTISENSE 5000 uses non-dispersive infrared absorption technology to accurately detect the end of a chamber cleaning cycle.

Wafer processing chambers are typically cleaned every cycle using a reactive gas like fluorine or chlorine. It is critical to know exactly when to stop the chamber cleaning cycle to prevent it from being damaged. Under-cleaning the chamber adversely affects the wafers and leads to increased wafer scrap.

Typical product features include:

  Compact and no moving parts
  Non dispersive Infra-red technology
  Real time graphical user interface
  Fast response time
  Analog and digital outputs
     
The OPTI-Sense 5000 extends the life of the chamber and also increases efficiency by saving time and maximizing yield. It also optimizes the use of expensive reactive gases that are employed in cleaning and extends the life of chamber consumables.

 

 
 
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